Ahmad, I, Roy, SS, Rahman, MdA, Okpalugo, TIT, Maguire, PD and McLaughlin, JAD (2009) Substrate effects on the microstructure of hydrogenated amorphous carbon films. CURRENT APPLIED PHYSICS, 9 (5). pp. 937-942. [Journal article]
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In this work, plasma enhanced chemical vapour deposition was used to prepare hydrogenated amorphous carbon films (a-C:H) on different substrates over a wide range of thickness. In order to observe clear substrate effect the films were produced under identical growth conditions. Raman and near edge X-ray absorption fine structure (NEXAFS) spectroscopies were employed to probe the chemical bonding of the films. For the films deposited on silicon substrates, the Raman WIG ratio and G-peak positions were constant for most thickness. For metallic and polymeric substrates, these parameters increased with Him thickness, suggesting a change from a sp(3)-bonded hydrogenated structure to a more sp(2) network, NEXAFS results also indicate a higher sp(2) content of a-C:H films grown on metals than silicon. The metals, which are poor carbide precursors, gave carbon films with low adhesion, easily delaminated from the substrate. The delamination can be decreased/eliminated by deposition of a thin (similar to 10 nm) silicon layer on stainless steel substrates prior to a-C:H coatings. Additionally we noted the electrical resistivity decreased with thickness and higher dielectric breakdown strength for a-C:H on silicon substrate. (C) 2008 Elsevier B.V. All rights reserved.
|Item Type:||Journal article|
|Keywords:||Diamond-like carbon; Chemical vapour deposition; Raman spectroscopy; Electrical properties|
|Faculties and Schools:||Faculty of Computing & Engineering|
Faculty of Computing & Engineering > School of Engineering
|Research Institutes and Groups:||Engineering Research Institute|
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
|Deposited By:||Mrs Ann Blair|
|Deposited On:||23 Oct 2009 11:06|
|Last Modified:||20 Feb 2014 12:28|
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