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Deposition of carbon films onto metal and silicon substrates by filtered cathodic vacuum arc, plasma enhanced CVD and unbalanced magnetron sputtering

Biomedical Sciences Research Institute Computer Science Research Institute Environmental Sciences Research Institute Nanotechnology & Advanced Materials Research Institute

Ahmad, I, Maguire, PD, Lemoine, P, Roy, SS and McLaughlin, JAD (2004) Deposition of carbon films onto metal and silicon substrates by filtered cathodic vacuum arc, plasma enhanced CVD and unbalanced magnetron sputtering. DIAMOND AND RELATED MATERIALS, 13 (4-8). pp. 1346-1349. [Journal article]

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URL: http://198.81.200.2/science?_ob=MImg&_imagekey=B6TWV-4B9DB3W-8-9&_cdi=5572&_user=126978&_orig=search&_coverDate=08%2F31%2F2004&_sk=999869995&view=c&wchp=dGLbVlb-zSkWA&md5=3d592308ddc186372900ed84f17c6a82&ie=/sdarticle.pdf

DOI: 10.1016/j.diamond.2003.11.026

Abstract

Comparison is made between films deposited onto metal and silicon substrates with variable thickness via PECVD, hydrogen-free filtered cathodic vacuum arc (FCVA) and unbalanced magnetron sputtering (UBMS). Raman spectroscopy, nanoindentation and Kelvin probe (for work function) were used to analyse the quality, structure, surface morphology and electrical properties of the films. The Raman I-d/I-g ratio ranged from 0.1 to 1.6, depending on substrate material, thickness and deposition technique. Relative work functions of FCVA and PECVD films were lower than those of UBMS films. UBMS films have, what appears to be an amorphous sp(2) carbon structure across the thickness range while PECVD and FCVA indicate an initial growth layer, up to 20 nm, that differs in sp(3)-content compared to thicker films, due to the influence of the substrate. In the former, this initial layer is characteristic of a polymeric high sp(3) a-C:H film but as the film thickness increases a harder film forms. FCVA films show a small but increasing sp(3)-content and growth rate as thickness increases, suggesting a lower subplantation effectiveness into the substrate compared to a-C. (C) 2003 Elsevier B.V. All rights reserved.

Item Type:Journal article
Keywords:diamond-like carbon; filtered cathodic vacuum arc; PECVD; unbalanced magnetron sputtering
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:299
Deposited By:Mrs Ann Blair
Deposited On:14 Sep 2009 09:44
Last Modified:21 Feb 2014 14:55

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