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Hydrogen softening and optical transparency in Si-incorporated hydrogenated amorphous carbon films

Biomedical Sciences Research Institute Computer Science Research Institute Environmental Sciences Research Institute Nanotechnology & Advanced Materials Research Institute

Abbas, GA, Papakonstantinou, P, McLaughlin, JAD, Weijers-Dall, TDM, Elliman, RG and Filik, J (2005) Hydrogen softening and optical transparency in Si-incorporated hydrogenated amorphous carbon films. JOURNAL OF APPLIED PHYSICS, 98 (10). p. 103505. [Journal article]

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URL: http://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=JAPIAU000098000010103505000001&idtype=cvips&prog=normal

DOI: 10.1063/1.2132088


High-resolution x-ray reflectivity (XRR) and heavy-ion elastic recoil detection were employed to study the role of hydrogen on the softening behavior observed in Si-incorporated hydrogenated amorphous carbon (Si-a-C:H) films synthesized by plasma-enhanced chemical-vapor deposition using tetramethylsilane (TMS) precursor in C2H2/Ar plasma. An enhancement of the optical band gap and a massive reduction in the density of the films prepared at high TMS flow rate were revealed, respectively, by spectroscopic ellipsometry and XRR analysis with the development of a double critical angle. A hydrogenation process was responsible for a rise in the density of voids and an associated reduction in the connectivity of the carbon network and the release of its residual stress. (c) 2005 American Institute of Physics.

Item Type:Journal article
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:281
Deposited By:Mrs Ann Blair
Deposited On:19 Oct 2009 13:10
Last Modified:05 Mar 2012 15:59

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