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Ultra-thin film deposition and characterisation of 10nm amorphous carbon layers for applications in magnetic storage devices

Biomedical Sciences Research Institute Computer Science Research Institute Environmental Sciences Research Institute Nanotechnology & Advanced Materials Research Institute

McLaughlin, JAD, Ogwu, PMA, Lamberton, R, Zhao, JF and Lemoine, P (2000) Ultra-thin film deposition and characterisation of 10nm amorphous carbon layers for applications in magnetic storage devices. INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 14 (2-3). pp. 167-180. [Journal article]

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Abstract

This paper will present an overview of our latest results using various ultra-thin film amorphous carbon deposition techniques, and focus on first to grow studies, nano-characterisation of the electrical, mechanical and barrier properties associated with films grown on various substrate types applied to the magnetic recording industry. Although some of the characterisation is carried out on 10nm coatings, the nanomechanical measurements are performed on samples with thickness values between 30nm to 200nm. This overview of our work deals with PECVD deposition techniques and examines ultra-thin film growth on Si and Al2O3: TiC substrates. Some results are presented on the functional benefits of doping a-C:H films with Silicon and Nitrogen. All the work is related to the ability to produce effective 3nm to 10nm overcoat layers for new magnetic recording applications.

Item Type:Journal article
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:18915
Deposited By:Mrs Ann Blair
Deposited On:19 Jul 2011 08:54
Last Modified:19 Jul 2011 08:54

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