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Maguire, PD, Molloy, J, Laverty, SJ and McLaughlin, JAD (1996) Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas. Journal of Vacuum Science & Technology A, 14 . pp. 3010-3016. [Journal article]
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| Item Type: | Journal article |
|---|---|
| Faculties and Schools: | Faculty of Computing & Engineering Faculty of Computing & Engineering > School of Engineering |
| Research Institutes and Groups: | Engineering Research Institute Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC) |
| ID Code: | 13960 |
| Deposited By: | Mrs Ann Blair |
| Deposited On: | 28 May 2010 12:41 |
| Last Modified: | 15 Jun 2011 10:52 |
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