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Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas

Biomedical Sciences Research Institute Computer Science Research Institute Environmental Sciences Research Institute Nanotechnology & Advanced Materials Research Institute

Maguire, PD, Molloy, J, Laverty, SJ and McLaughlin, JAD (1996) Etching characteristics of tin oxide thin films in argon-chlorine radio frequency plasmas. Journal of Vacuum Science & Technology A, 14 . pp. 3010-3016. [Journal article]

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Item Type:Journal article
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:13960
Deposited By:Mrs Ann Blair
Deposited On:28 May 2010 12:41
Last Modified:15 Jun 2011 10:52

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