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Controlled photochemical release of nitric oxide from O2-naphthylmethyl-and O2-naphthylallyl-substituted diazeniumdiolates

Biomedical Sciences Research Institute Computer Science Research Institute Environmental Sciences Research Institute Nanotechnology & Advanced Materials Research Institute

Bushan, KM, Xu, H, Ruane, PH, D'Sa, RA, Pavlos, CM, Smith, JA, Celius, TC and Toscano, JP (2002) Controlled photochemical release of nitric oxide from O2-naphthylmethyl-and O2-naphthylallyl-substituted diazeniumdiolates. Journal of the American Chemical Society, 124 (43). pp. 12640-12641. [Journal article]

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Item Type:Journal article
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:12724
Deposited By:Dr Raechelle D'Sa
Deposited On:13 Apr 2010 13:50
Last Modified:18 Aug 2011 11:16

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